Compact Atmosphere Controlled RTP Furnace with 4" OD Quartz Tube up to 1000ºC

It is a compact rapid thermal processing tube furnace with a 100mm diameter processing quartz tube and vacuum flange. It is designed for annealing semiconductor wafers or solar cells. It is heated by IR lamps with a max heating rate of 1100ºC/min. 30 segment precision temperature controller with +/-1ºC accuracy is built into the furnace to allow for heating, dwelling, and cooling at various steps.

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Product Introduction

Brief Introduction:

It is a compact rapid thermal processing tube furnace with a 100mm diameter processing quartz tube and vacuum flange. It is designed for annealing semiconductor wafers or solar cells. It is heated by IR lamps with a max heating rate of 1100ºC/min. 30 segment precision temperature controller with +/-1ºC accuracy is built into the furnace to allow for heating, dwelling, and cooling at various steps.

The main features are as below:

  1. Great temperature uniformity.
  2. Over temperature protection and alarm.
  3. PID automatic control via SCR power control.

 

Technical Parameter:

Display LED
Structure Split and Rail Chamber
Temperature <1100℃ (1100 for limiting)
Max. Heating Rate 1100℃/min
Suggest Heating Rate ≤300℃/min
Temperature Zone Single
Temperature Control Accuracy ±1℃
Hot zone length 200mm
  Tube Diameter ID100
  Tube Material Quartz Tube
Heating Element IR Lamps
Sealing Vacuum Flange
Thermocouple N Type
Max. Power 18 KW
Working Voltage AC 380V Three phases, 50 Hz (or according to your requirement)
Temperature Control PID automatic control via SCR power control
Heating curves 30 steps programmable
Chamber material Alumina Fiber
Warranty One year limited warranty (Consumable parts such as heating elements are not covered by the warranty)

 

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