1100℃ Slide Chamber Tube Furnace

It adopts international advanced manufacturing technology, modelling is novel and reasonable structure; Has been all kinds of the validation sample experiments, and has been widely used in semiconductor device research and development and production, etc

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Product Introduction

Brief Introduction:  

It adopts international advanced manufacturing technology, modelling is novel and reasonable structure; Has been all kinds of the validation sample experiments, and has been widely used in semiconductor device research and development and production, etc

The main features are as below:

  1. Operation Temperature: 1100℃
  2. Maximum energy efficiency is achieved by surrounding the chamber with thermal-efficient alumina fiber ceramic insulation.
  3. Heavy duty double layer structure with cooling fan. Lower temperature in outside case.
  4. Can be used for graphene-growing or CVD system for the experiment for the RTP requirement.
  5. PID automatic control via current limiting phase angle fired the resistor, e.g. SCR(Silicon Controlled Rectifier).
  6. Power control with 30 segments programmable.
  7. Vacuum, in reversibility or protective atmosphere.

Technical Parameter:

Display LED
Chamber Split and rail
Max. Temperature 1200℃ for limiting
Continuous Working Temp. ≤1100℃
Heating Rate Suggestion 0~10℃/min(max. 20℃/min)
Temperature Zone Single 440mm
Temperature Control Accuracy ±1℃
  Tube Size Φ80×1400mm
Heating Element Fe-Cr-Al Alloy doped by Mo
Thermocouple K Type
Max. Power 3.0 KW
Working Voltage AC 208V-240V single phase, 50 Hz (or according to your requirement)
Temperature Control PID automatic control via SCR power control

R485 Communication Port

Heating curves 30 steps programmable
Chamber material Alumina Fiber

Note: Different Tube Sizes and temperature are available based on your requirement, pls contact us freely if there is any specific requirement.

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