1600C 3 Zones Chemical Vapor Deposition Furnace

Chemical vapor deposition (CVD) is a film growth technique that make gaseous substance containing thin films react by means of a glow discharge. According to experimental requirements, Our company designed this equipment to meet the needs of various types of film study.

Request A Quote Send E-Mail

Product Introduction

Brief Introduction:

Technical Parameter

Tube Furnace	Display	LED
	Max. Temperature	1200°C (for limiting)
	Continuous Woking Temp.	≤1100℃
	Heating Rate	Suggestion: 0~5℃/min If use temp. Controller.
	Temperature Zone	200+200+200mm
	Heating Element	Fe-Cr-Al Alloy doped by Mo
	Thermocouple	N type
	Temperature Control Accuracy	±1℃
	Tube Size	OD 60 mm x (1000-1200mm) length
	Tube Size	Material:Alumina Tube
	Temperature Controller	30 programmable segments for precise control of heating rate, cooling rate and dwell time. Built-in over temperature alarm and protection allows for operation without an attendant. A N-type thermal couple is built in the furnace to control furnace temperature
	Heating curves	30 steps programmable
	Vacuum Flange	Stainless Steel vacuum flange with valve
	Power	380V, 50 Hz, single phase at max. 10KW
Vacuum Pump	Rotary Vane Vacuum Pump	vacuum inside the tube is around 1 Torr. The rotary vane vacuum pump will be designed into a cart with wheel.
Mass Flow Meters	Three precision mass flow meters : MFC 1: 0-500sccm MFC 2 :0-500sccm MFC 3 :0-500sccm MFC 4:0-500sccm One gas mixing tank is installed on bottom case with 4 stainless steel needle valves is installed on left side of bottom case to control 4 type gases mixing manually
Digital Vacuum Gauge	3.8x10^-5 to 1125 Torr measurement range Anti-corrosive, gas-type independent