1200C Max. PECVD Tube Furnace with 4 Channels Gas Delivery & Vacuum Pump

Plasma-enhanced chemical vapor deposition (PECVD) is a film growth technique that make gaseous substance containing thin films react by means of a glow discharge (plasma). According to experimental requirements,Our company designed this equipment which the equipment is designed to meet the needs of various types of film study.

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Product Introduction

Brief Introduction:

Technical Parameter:

Tube Furnace	Display	LED
	Max. Temperature	1200℃
	Continuous Woking Temp.	≤1100℃
	Heating Rate	0~10℃/min
	Temperature Zone	Single
	Accuracy	±1℃
	Tube Size	3.14"OD x 2.83"ID x 48'' Length
	Temperature Control	PID automatic control via SCR power control
	Heating curves	30 steps programmable
	Heating zone	440mm
	Power	220V, 50 Hz, single phase at max. 4KW
Plasma RF Power supply	Output Power	5 -500W adjustable with ± 1% stability
	RF frequency	13.56 MHz ±0.005% stability
	Reflection Power	200W max.
	Matching	Automatic
	RF Output Port	50 Ω, N-type, female
	Noise	<50 dB.
	Cooling	Air cooling.
	Power	220V, 50Hz
Anti-corrosive Pressure Gauge	3.8x10^-5 to 1125 Torr measurement range Anti-corrosive, gas-type independent
Vacuum Pump and valve	Heavy Duty Rotary Vane Vacuum Pump with max. vacuum pressure 10^-2torr. KFD25 adapter and stainless steel pipe are connected between pump tube flange with precision ball valve Digital vacuum pressure gauge and display are installed with the furnace
Mass Flow meters	Four precision mass flow meters : MFC 1: Gas flow range from 0~100 sccm MFC 2&3: Control range from 0~200 sccm MFC 4: Control range from 0~500 sccm One gas mixing tank is installed on bottom case with liquid release valve 4 stainless steel needle valves is installed on left side of bottom case to control 4type gases mixing manually Gas inlet fitting: four 1/4NPS Gas outlet fitting: four 1/4NPS