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Small Lab Vacuum Crucible Furnace
Fengshi crucible furnace is an standard vacuum chamber furnace. It equips a high purity quartz crucible chamber sitting horizontally. Water-cooled stainless steel vacuum flanges with valves are installed to achieve a vacuum of 10-2 to10-5 Torr through a mechanical or molecular vacuum pump. It is designed for calcining or annealing semiconductor wafers under vacuum or various other gas atmospheres with a temperature up to 1100°C. It also can also be used as vacuum brazing furnace for fusing small parts.
Introduction:
Fengshi crucible furnace is an standard vacuum chamber furnace. It equips a high purity quartz crucible chamber sitting horizontally. Water-cooled stainless steel vacuum flanges with valves are installed to achieve a vacuum of 10-2 to10-5 Torr through a mechanical or molecular vacuum pump. It is designed for calcining or annealing semiconductor wafers under vacuum or various other gas atmospheres with a temperature up to 1100°C. It also can also be used as vacuum brazing furnace for fusing small parts.
Standard Feature:
- High purity fibrous alumina insulation for maximum energy saving .
- Double layer steel structure with air cooling fan to keep furnace's exteriors safe to touch.
- PID automatic control via current limiting phase angle fired the resistor.
Technical Parameter:
| Max. Temp(℃) | 1200oC for limiting |
| Working Temp. | ≦1100oC |
| Chamber Size | 100x200mm Dia.x D
or customize as your requirement |
| Max. Power | 2.5 Kw |
| Door Structure | Water cooled flange |
| Heating Element | Resistance wire |
| Thermocouple | N Type |
| Heating Rate | ≦10oC/min |
| Temperature Control Accuracy | ±1℃ |
| Temperature Control | PID automatic control via SCR power control |
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