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Fengshi crucible furnace is an standard vacuum chamber furnace. It equips a high purity quartz crucible chamber sitting horizontally. Water-cooled stainless steel vacuum flanges with valves are installed to achieve a vacuum of 10-2 to10-5 Torr through a mechanical or molecular vacuum pump. It is designed for calcining or annealing semiconductor wafers under vacuum or various other gas atmospheres with a temperature up to 1100°C. It also can also be used as vacuum brazing furnace for fusing small parts.
Introduction:
Fengshi crucible furnace is an standard vacuum chamber furnace. It equips a high purity quartz crucible chamber sitting horizontally. Water-cooled stainless steel vacuum flanges with valves are installed to achieve a vacuum of 10-2 to10-5 Torr through a mechanical or molecular vacuum pump. It is designed for calcining or annealing semiconductor wafers under vacuum or various other gas atmospheres with a temperature up to 1100°C. It also can also be used as vacuum brazing furnace for fusing small parts.
Standard Feature:
Technical Parameter:
Max. Temp(℃) | 1200oC for limiting |
Working Temp. | ≦1100oC |
Chamber Size | 200x340mm Dia.x D
or customize as your requirement |
Max. Power | 3.5 Kw |
Door Structure | Water cooled flange |
Heating Element | Resistance wire |
Thermocouple | N Type |
Heating Rate | ≦10oC/min |
Temperature Control Accuracy | ±1℃ |
Temperature Control | PID automatic control via SCR power control |